The application discloses a method (200) for the manufacture of a structure (100) on a substrate (120) utilising lithographic techniques. The patterning on the substrate (120) is achieved in one aspect of the invention by creating a patterned mask (110) on the substrate (120) using latex spheres (105) and depositing an inhibition layer (130) through the aper- tures of the patterned mask (110) of the latex spheres (105) such that an inhibition layer (130) is formed. The patterned mask (110) is removed before the deposition of a first self assembled monolayer (140) on the substrate (120). The inhibition layer (130) is then removed, before a second self assembled monolayer (150) is deposited on the substrate where it was covered by the inhibition layer (130) before its removal (100).

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Document History
  • Publication: Nov 20, 2008
  • Application: May 13, 2008
    WO EP 2008055858 W
  • Priority: May 9, 2007
    DE DE 102007022251 A

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