Electronic Interconnects And Devices With Topological Surface States And Methods For Fabricating Same

Abstract

An interconnect is disclosed with enhanced immunity of electrical conductivity to defects. The interconnect includes a material with charge carriers having topological surface states. Also disclosed is a method for fabricating such interconnects. Also disclosed is an integrated circuit including such interconnects. Also disclosed is a gated electronic device including a material with charge carriers having topological surface states.


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Document History
  • Publication: Apr 4, 2017
  • Application: Oct 21, 2015
    US US 201514919008 A
  • Priority: Oct 21, 2015
    US US 201514919008 A
  • Priority: Mar 3, 2011
    US US 201113039762 A
  • Priority: Jul 28, 2010
    US US 36855210 P

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