Fractal Type Manganese-copper-film Ultra-high Pressure Sensor

  • Published: May 29, 2018
  • Earliest Priority: Dec 15 2017
  • Family: 1
  • Cited Works: 3
  • Cited by: 1
  • Cites: 5
  • Additional Info: Cited Works

The full document isn't yet available to us from the patent office.


The invention relates to a fractal type manganese-copper-film ultra-high pressure sensor comprising a substrate. A sensitive element and electrodes are formed on the substrate in a sputtering manner by an MEMS technology. Each of the input terminal and the output terminal of the sensitive element is connected with two electrodes. An organic insulating film is pasted on the surfaces of the sensitive element and the electrodes. The sensitive element has a self-similar fractal structure and is formed by using a manganese-copper target material in a sputtering manner. The substrate is made of an organic glass material. The organic insulating film is made from Teflon or polyimide. According to the invention, the fractal type manganese-copper-film ultra-high pressure sensor has characteristics of high precision, fast speed, large output signal, and high adaptability to small-scale detonation pressure measurement and the like; and the test precision can reach to about 3%. The sensor is suitable for measurement of the ultra-high pressure generated by the micro-scale detonation or impact within the range of 1 to 50Gpa.


Information currently unavailable.

Document Preview
No Image Yet
Document History
  • Publication: May 29, 2018
  • Application: Dec 15, 2017
    CN CN 201711344589 A
  • Priority: Dec 15, 2017
    CN CN 201711344589 A

Download Citation

Sign in to the Lens