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Select more for logical variants
Add to collection
Total patents: more than 10k.
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for invention","granted":true,"earliest_filing_date":"2010-06-02","grant_date":"2013-04-09","anticipated_term_date":"2030-06-02","has_disclaimer":false,"patent_status":"ACTIVE","publication_count":2,"has_spc":false,"has_grant_event":true,"has_entry_into_national_phase":false},"abstract":{"en":[{"text":"Embodiments of the present invention relate to a wavefront imaging sensor (WIS) comprising an aperture layer having an aperture, a light detector having a surface and a transparent layer between the aperture layer and the light detector. The light detector can receive a light projection at the surface from light passing through the aperture. The light detector can also separately measure amplitude and phase information of a wavefront at the aperture based on the received light projection. The transparent layer has a thickness designed to locate the surface of the light detector approximately at a self-focusing plane in a high Fresnel number regime to narrow the light projection.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"}]},"abstract_lang":["en"],"has_abstract":true,"claim":{"en":[{"text":"1. A wavefront imaging sensor comprising, an aperture layer having an aperture of set dimensions; a light detector having a surface, the light detector configured to receive a light projection at the surface from light passing through the aperture, the light detector further configured to separately measure amplitude and phase information of a wavefront based on the received light projection; and a transparent layer between the aperture layer and the light detector, the transparent layer having a thickness locating the surface of the light detector approximately at a self-focusing plane in a high Fresnel number regime to narrow the light projection.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"2. The wavefront imaging sensor of claim 1 , wherein the light detector measures the phase information of the wavefront at the aperture by estimating a lateral shift of the light projection and determining the phase information based on the estimated lateral shift.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"3. The wavefront imaging sensor of claim 2 , wherein the light detector comprises a plurality of light detecting elements, each light detecting element receiving a signal, and wherein the light detector estimates a lateral shift of the light projection by estimating a center of the projection on the surface of the light detector.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"4. The wavefront imaging sensor of claim 2 , wherein the light detector is configured to measure the phase information of the wavefront at one of the apertures by estimating a lateral shift of the light projection corresponding to the one of the apertures.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"5. The wavefront imaging sensor of claim 1 , wherein the light detector measures the amplitude information of the wavefront at the aperture by summing up the intensity signals over the light projection.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"6. The wavefront imaging sensor of claim 1 , wherein the light detector comprises a plurality of light detecting elements, each light detecting element receiving a signal, and wherein the light detector measures the amplitude information of the wavefront at the aperture by summing up the signals received by the light detecting elements.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"7. The wavefront imaging sensor of claim 1 , further comprising a processor communicatively coupled to the light detector, the processor configured to generate a phase image based on the measured phase information of the wavefront along a user defined direction.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"8. The wavefront imaging sensor of claim 1 , further comprising a processor communicatively coupled to the light detector, the processor configured to generate a phase image based on the measured phase information of the wavefront along an axis of the aperture layer.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"9. The wavefront imaging sensor of claim 1 , further comprising a processor communicatively coupled to the light detector, the processor configured to generate a phase image based on a magnitude of the phase gradient vector of the wavefront determined from the measured phase information of the wavefront.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"10. The wavefront imaging sensor of claim 1 , further comprising a lens at the aperture.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"11. The wavefront imaging sensor of claim 1 , wherein the light projection is a minimum light projection associated with the self-focusing plane.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"12. The wavefront imaging sensor of claim 1 , wherein the transparent layer extends from the aperture layer to the surface of the light detector.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"13. The wavefront imaging sensor of claim 1 , wherein the wavefront imaging sensor is in the form of a wavefront imaging sensor chip.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"14. A wavefront imaging sensor comprising, an aperture layer having an array of apertures of set dimensions; a light detector having a surface, the light detector configured to receive one or more light projections at the surface from light passing through the array of apertures, the light detector further configured to separately measure amplitude and phase information of a wavefront based on the received one or more light projections; and a transparent layer between the aperture layer and the light detector, the transparent layer having a thickness locating the surface of the light detector approximately at a self-focusing plane in a high Fresnel number regime to narrow the one or more light projections.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"15. The wavefront imaging sensor of claim 14 , wherein the apertures in the array of apertures are closely spaced.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"16. The wavefront imaging sensor of claim 14 , wherein the light detector includes a plurality of arrays of light detecting elements, wherein each array of light detecting elements is assigned to an aperture.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"17. The wavefront imaging sensor of claim 14 , wherein the light detector measures the amplitude information of the wavefront at one of the apertures by summing up the intensity signals received by the array of light detecting elements assigned to the one of the apertures.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"18. The wavefront imaging sensor of claim 14 , wherein the transparent layer extends from the aperture layer to the surface of the light detector.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"19. A method for separately measuring the amplitude and phase gradient of a wavefront using a wavefront imaging sensor having an aperture layer, a light detector and a transparent layer between the aperture layer and the light detector, the method comprising: receiving a light projection at a surface of the light detector, the light projection from light passing through an aperture of the aperture layer, wherein the aperture has set dimensions, and wherein the surface is located approximately at a self-focusing plane in a high Fresnel number regime to narrow the light projection; estimating a lateral shift of the light projection by estimating a center of the light projection on the surface; measuring the phase gradient of the wavefront at the aperture using the estimated lateral shift of the light projection; and measuring the amplitude of the wavefront at the aperture by summing up intensity signals received by the light detecting elements assigned to the aperture.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"},{"text":"20. The method of claim 19 , wherein the transparent layer extends from the aperture layer to the surface of the light detector.","lang":"en","source":"USPTO_FULLTEXT","data_format":"ORIGINAL"}]},"claim_lang":["en"],"has_claim":true,"description":{"en":{"text":"CROSS-REFERENCES TO RELATED APPLICATIONS This is a non-provisional application of and claims priority to U.S. Provisional Patent Application No. 61/183,868 entitled “Functionalized CMOS Sensor Chips for Wavefront and Darkfield Microscopy” filed on Jun. 3, 2009 and Provisional Patent Application No. 61/240,556 entitled “Wavefront Imaging Sensor” filed on Sep. 8, 2009. These provisional applications are hereby incorporated by reference in their entirety for all purposes. This non-provisional application is related to the following co-pending and commonly-assigned patent applications, which are hereby incorporated by reference in their entirety for all purposes: U.S. patent application Ser. No. 11/125,718 entitled “Optofluidic Microscope Device” filed on May 9, 2005.U.S. patent application Ser. No. 11/686,095 entitled “Optofluidic Microscope Device” filed on Mar. 14, 2007.U.S. patent application Ser. No. 11/743,581 entitled “On-chip Microscope/Beam Profiler based on Differential Interference Contrast and/or Surface Plasmon Assisted Interference” filed on May 2, 2007.U.S. patent application Ser. No. 12/398,098 entitled “Methods of Using Optofluidic Microscope Devices” filed Mar. 4, 2009.U.S. patent application Ser. No. 12/398,050 entitled “Optofluidic Microscope Device with Photosensor Array” filed on Mar. 4, 2009.U.S. patent application Ser. No. 12/638,518 entitled “Techniques for Improving Optofluidic Microscope Devices” filed on Dec. 15, 2009.U.S. patent application Ser. No. 12/435,165 entitled “Quantitative Differential Interference Contrast (DIC) Microscopy and Photography based on Wavefront Sensors” filed May 4, 2009.U.S. patent application Ser. No. 12/690,952 entitled “Quantitative Differential Interference Contrast (DIC) Microscopy and its Computed Depth Sectioning Ability” filed on Jan. 21, 2010. The following non-provisional patent application is being filed on the same day and is hereby incorporated by reference in its entirety for all purposes: U.S. patent application Ser. No. 12/792,059 filed on Jun. 2, 2010 entitled “Surface Wave Enabled Darkfield Aperture”. BACKGROUND OF THE INVENTION Embodiments of the present invention generally relate to phase sensing devices used in applications such as microscopy and photography. More specifically, certain embodiments relate to a wavefront imaging sensor (WIS) configured to measure phase variations and/or amplitude variations of a light field in a high Fresnel number regime. A light field contains two primary sets of characteristics—amplitude/intensity and phase front variations. At present, commercial optical sensors are designed to operate much like our retina and are only responsive to light field amplitude/intensity variations. The phase of light is very important for imaging because many objects, such as transparent organisms and cells, only significantly modulate the phase of transmitted light and do not change the amplitude/intensity much. Sometimes, contrast agents (e.g., stains) can be used to generate amplitude/intensity variations in these transparent objects, however staining involves preparation and can damage specimens. For this reason and others, phase microscopes are highly valued in biomedical applications for their ability to render contrast based on refractive index variations in unstained biological samples. Such applications include field analyses of bloodborne and waterborne pathogens where cost considerations and ease-of-use are important, and analysis of biopsy sections to determine tumour margins during surgical procedures where rapid processing is critical. Phase microscopes are also useful where staining is undesirable or simply not an option. Such applications include examinations of oocytes and embryos during in-vitro fertilization procedures, and longitudinal imaging of live cells or organisms. Examples of these applications can be found in S. L. Stanley, “Amoebiasis,” Lancet 361, 1025-1034 (2003), M. M. Haglund, M. S. Berger, and D. W. Hochman, “Enhanced optical imaging of human gliomas and tumor margins,” Neurosurgery 38, 308-317 (1996), J. Vanblerkom, H. Bell, and G. Henry, “The occurrence, recognition and developmental fate of pseudo-multipronuclear eggs after in-vitro fertilization of human oocytes,” Hum. Reprod. 2, pp. 217-225 (1987) and R. J. Sommer, and P. W. Sternberg, “Changes of induction and competence during the evolution of vulva development in nematodes,” Science 265, 114-118 (1994), which are hereby incorporated by reference in their entirety for all purposes. Conventional differential interference contrast (DIC) microscopes and, to a lesser extent, phase contrast microscopes and Hoffman phase microscopes have been the primary phase microscopes used in the past five decades. FIG. 1( a ) is a schematic illustration of the underlying principle of a conventional DIC device (e.g., such as a conventional DIC microscope or camera). A conventional DIC device operates by interfering slightly displaced duplicate image light fields of polarized light. FIG. 1( b ) is a schematic drawing of a conventional DIC device. An example of a phase contrast microscope can be found in F. Zernike, “Phase contrast, a new method for the microscopic observation of transparent objects,” Physics 9, 686-698 (1942). An example of a Hoffman phase microscope can be found in R. Hoffman, and L. Gross, “The modulation contrast microscope,” Nature 254, 586-588 (1975). An example of a conventional DIC microscope can be found in G. Nomarski, “New theory of image formation in differential interference microscopy,” Journal of the Optical Society of America 59, 1524-& (1969), and an imaging strategy used by a conventional DIC microscope can be found in “DIC,” http://www.microscopyu.com/articles/dic/dicindex.html, (2007). These three references are incorporated by reference in their entirety for all purposes. However, these conventional phase microscopes have several limitations. One major limitation of the techniques used by these conventional devices is that phase variations are inextricably mixed with the amplitude/intensity variations that arise from absorption and/or scattering by an object. As a consequence of this entanglement of amplitude and phase information, these conventional techniques do not provide quantitative phase measurements. This limitation can introduce ambiguities in the rendered image of the object. Another limitation of conventional DIC devices is that they use polarized light and depend on the polarization in their phase-imaging strategies. Since polarized light must be used, conventional DIC devices generate images of birefringent samples, such as muscle sections and collagen matrices that typically suffer from significant artifacts. An example of a DIC microscope that uses polarization in its phase-imaging strategy can be found in B. C. Albensi, E. V. Ilkanich, G. Dini, and D. Janigro, “Elements of Scientific Visualization in Basic Neuroscience Research,” BioScience 54, 1127-1137 (2004), which is hereby incorporated by reference in its entirety for all purposes. Since polarized light must be used, these devices generate images of birefringent objects (e.g., potato starch storage granules) that typically suffer from significant artifacts. Furthermore, these techniques use elaborate and bulky optical arrangements that are expensive and require high maintenance. The relatively high cost of these systems prevents their broader use. In recent years, other phase microscopy techniques have been developed such as 1) phase shifting interferometry schemes—where two or more interferograms with different phase shifts are acquired sequentially and a phase image is generated therefrom, 2) digital holography or Hilbert phase microscopy—where high frequency spatial fringes encoded on the interferogram are demodulated to generate the phase image, 3) swept-source phase microscopy—where modulation in the interferogram generated by a wavelength sweep can be processed to create a phase image, 4) Polarization quadrature microscopy—where phase images are generated by a polarization based quadrature interferometer, and 5) harmonically matched grating-based phase microscopy—which makes use of non-trivial phase shifts between the different diffraction orders from a harmonic combination grating to generate phase images. Examples of these phase microscopy techniques can be found in K. Creath, “Phase-measurement interferometry techniques,” Prog. Opt. 26, 44 (1988), K. J. Chalut, W. J. Brown, and A. Wax, “Quantitative phase microscopy with asynchronous digital holography,” Optics Express 15, 3047-3052 (2007), P. Marquet, B. Rappaz, P. J. Magistretti, E. Cuche, Y. Emery, T. Colomb, and C. Depeursinge, “Digital holographic microscopy: a noninvasive contrast imaging technique allowing quantitative visualization of living cells with subwavelength axial accuracy,” Optics Letters 30, 468-470 (2005), B. Rappaz, P. Marquet, E. Cuche, Y. Emery, C. Depeursinge, and P. J. Magistretti, “Measurement of the integral refractive index and dynamic cell morphometry of living cells with digital holographic microscopy,” Optics Express 13, 9361-9373 (2005), T. Ikeda, G. Popescu, R. R. Dasari, and M. S. Feld, “Hilbert phase microscopy for investigating fast dynamics in transparent systems,” Optics Letters 30, 1165-1167 (2005), G. Popescu, T. Ikeda, K. Goda, C. A. Best-Popescu, M. Laposata, S. Manley, R. R. Dasari, K. Badizadegan, and M. S. Feld, “Optical measurement of cell membrane tension,” Physical Review Letters 97 (2006), M. V. Sarunic, S. Weinberg, and J. A. Izatt, “Full-field swept-source phase microscopy,” Optics Letters 31, 1462-1464 (2006), D. O. Hogenboom, C. A. DiMarzio, T. J. Gaudette, A. J. Devaney, and S. C. Lindberg, “Three-dimensional images generated by quadrature interferometry,” Optics Letters 23, 783-785 (1998), Z. Yaqoob, J. G. Wu, X. Q. Cui, X. Heng, and C. H. Yang, “Harmonically-related diffraction gratings-based interferometer for quadrature phase measurements,” Optics Express 14, 8127-8137 (2006), and W. Choi, C. Fang-Yen, K. Badizadegan, S. Oh, N. Lue, R. R. Dasari, and M. S. Feld, “Tomographic phase microscopy,” Nature Methods 4, 717-719 (2007), which are hereby incorporated by reference in their entirety for all purposes. However, as with phase contrast and conventional DIC microscopy, these advanced methods contain significant optical elements and have relatively steep learning curves. In addition, these phase microscopy techniques invariably require the use of a laser source to provide coherent light. Another technique for calculating optical phase includes collecting two or three successive images of the specimen around its focal plane. An example of this technique can be found in A. Barty, K. A. Nugent, D. Paganin, and A. Roberts, “Quantitative optical phase microscopy,” Optics Letters 23, 817-819 (1998), which is hereby incorporated by reference in its entirety for all purposes. This technique however, requires the physical actuation of the camera to be placed in three distinct positions in order to provide enough data to render a single phase image, and is therefore intrinsically limited in speed. In addition, the presence of a mechanical actuation system can also introduce undesirable vibrations to the microscope and potentially pose a challenge to sensitive experiments. BRIEF SUMMARY OF THE INVENTION Embodiments of the present invention relate to a wavefront imaging device (WIS) that measures amplitude and/or phase variations of an image wavefront induced by the presence of an object and generate images of the object. The WIS has an aperture layer having one or more apertures and a light detector. A transparent layer separates the light detector and the aperture layer. In operation, an objection in the light field can induce an image wavefront. The light detector at the back of the WIS receives the distribution of light through the aperture or apertures in the form of a light projection or light projections. The light detector is placed at a self-focusing plane in the high Fresnel number regime to narrow the light projections. The light detector measures the lateral movement of the narrowed light projection(s) and determines the phase gradient from this movement. The WIS can also sum up the intensity over each light projection to determine the amplitude or total intensity at each aperture. The WIS can then numerically generate one or more images from the amplitude and/or phase gradient information. One embodiment is directed to a wavefront imaging sensor comprising an aperture layer having an aperture, a light detector having a surface and a transparent layer between the aperture layer and the light detector. The light detector is configured to receive a light projection at the surface of the light detector. The light projection is from light passing through the aperture. The light detector is further configured to separately measure amplitude and phase information of a wavefront based on the received light projection. The transparent layer has a thickness designed to locate the surface of the light detector approximately at a self-focusing plane in a high Fresnel number regime to narrow the light projection. Another embodiment is directed to a wavefront imaging sensor comprising an aperture layer having an array of apertures, a light detector having a surface and a transparent layer between the aperture layer and the light detector. The light detector is configured to receive one or more light projections at the surface from light passing through the array of apertures. The light detector is further configured to separately measure amplitude and phase information of a wavefront based on the received one or more light projections. The transparent layer has a thickness designed to locate the surface of the light detector approximately at a self-focusing plane in a high Fresnel number regime to narrow the one or more light projections. Another embodiment is directed to a method for separately measuring the amplitude and phase gradient of a wavefront using a wavefront imaging sensor having an aperture layer, a light detector and a transparent layer between the aperture layer and the light detector. The method includes receiving a light projection at a surface of the light detector. The light projection is from light passing through an aperture of the aperture layer. The surface is located approximately at a self-focusing plane in a high Fresnel number regime to narrow the light projection. The method also estimates a lateral shift of the light projection by estimating a center of the light projection on the surface. Then, the method measures the phase gradient of the wavefront at the aperture using the estimated lateral shift of the light projection and measures the amplitude of the wavefront at the aperture by summing up intensity signals received by the light detecting elements assigned to the aperture. These and other embodiments of the invention are described in further detail below. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1( a ) is a schematic illustration of the underlying principle of a conventional DIC device. FIG. 1( b ) is a schematic drawing of a conventional DIC device. FIG. 2( a ) is schematic drawing of a perspective view of components of a WIS, according to an embodiment of the invention. FIG. 2( b ) is schematic drawing of a cross sectional of the WIS of FIG. 2( a ) through an aperture, according to an embodiment of the invention. FIGS. 3( a ) and 3 ( b ) are schematic drawings of a perspective view of components of a WIS, according to embodiments of the invention. FIG. 4 is a schematic drawing of a side view of a WIS system having components of a WIS and components of a microscope for imaging the light projected through the apertures and light projections at different axial displacements, according to an embodiment of the invention. FIG. 5( a ) is a computer simulated illustration showing a side view of components of a WIS, according to an embodiment of the invention. FIG. 5( b ) is a graph of the size of the images of light projections at different distances from the aperture layer, according to an embodiment of the invention. FIG. 6( a ) is an image of a portion of an aperture layer having apertures in the form of a two-dimensional (6×6) array of apertures, according to an embodiment of the invention. FIG. 6( b ) is a photograph of a CMOS sensor chip. FIG. 6( c ) is a photograph of a WIS system comprising a conventional microscope employing a WIS, according to an embodiment of the invention. FIG. 7( a ) is an intensity/amplitude image of the worm taken by a conventional bright field microscope. FIG. 7( b ) is a DIC image (shear direction is along the y axis throughout the imaging experiments in this article) of the worm taken by a conventional DIC microscope. FIG. 7( c ) is an intensity image of the worm taken by a microscope employing a WIS (Wavefront Microscope), according to an embodiment of the invention. FIG. 7( d ) is a normalized phase gradient image along the y axis of the worm taken by the Wavefront Microscope, according to an embodiment of the invention. FIG. 7( e ) is a normalized phase gradient image along the x axis of the worm taken by the Wavefront Microscope, according to an embodiment of the invention. FIG. 8( a ) is an intensity/amplitude image of the ascaris taken by a conventional bright field microscope. FIG. 8( b ) is a DIC image of the ascaris taken by a conventional DIC microscope. FIG. 8( c ) is an intensity image of the ascaris taken by a microscope employing a WIS (Wavefront Microscope), according to an embodiment of the invention. FIG. 8( d ) is a normalized phase gradient image along the y axis of the ascaris taken by the Wavefront Microscope, according to an embodiment of the invention. FIG. 8( e ) is a normalized phase gradient image along the x axis of the ascaris taken by the Wavefront Microscope, according to an embodiment of the invention. FIG. 8( f ) is a graph comparing the line profiled from the DIC image and the DIC phase gradient image in the y-axis, according to an embodiment of the invention. FIG. 9( a ) is an intensity/amplitude image of the strongly birefringent ctenoid fish scale taken by a conventional bright field microscope. FIG. 9( b ) is a DIC image of the strongly birefringent ctenoid fish scale taken by a conventional DIC microscope. FIG. 9( c ) is an intensity image of the strongly birefringent ctenoid fish scale taken by a microscope employing a WIS (Wavefront Microscope), according to an embodiment of the invention. FIG. 9( d ) is a normalized phase gradient image along the y axis of the strongly birefringent ctenoid fish scale taken by the Wavefront Microscope, according to an embodiment of the invention. FIG. 9( e ) is a normalized phase gradient image along the x axis of the strongly birefringent ctenoid fish scale taken by the Wavefront Microscope, according to an embodiment of the invention. FIG. 10 is a phase-gradient-vector magnitude image of the unstained worm of FIGS. 7( a )- 7 ( e ) taken with a Wavefront Microscope, according to an embodiment of the invention. FIG. 11 is perspective view of components of a WIS system including processing components, according to embodiments of the invention. FIGS. 12 ( a ) and 12 ( b ) show a side view of components of a WIS system for calibrating a WIS, according to an embodiment of the invention. FIGS. 12( c ) and 12 ( d ) are graphs of the normalized phase gradient response in both x and y directions to different incident angles θ x and θ y , according to this embodiment. FIG. 13 is a flow chart of method of using a WIS system having a WIS to detect a light projection and/or image an object, according to embodiments of the invention. FIG. 14 shows a block diagram of subsystems that may be present in computer devices that are used in a WIS system, according to embodiments of the invention. DETAILED DESCRIPTION OF THE INVENTION Embodiments of the present invention will be described below with reference to the accompanying drawings. Some embodiments include a WIS (wavefront imaging sensor) configured to measure the amplitude and/or phase variations of an image wavefront. The WIS has an aperture layer with one or more closely spaced apertures and a light detector receiving light through the aperture(s) in the form of light projection(s). The WIS also includes a transparent layer between the light detector and the aperture layer. The thickness of the transparent layer can be sized to locate the light detector at a self-focusing plane in the high Fresnel region to narrow the light projection(s). During operation, the light detector at the back of the WIS receives the light projection(s) and can measure the lateral movement of the narrowed light projection(s) due to a phase gradient of the image wavefront. The WIS can determine the phase gradient based on the lateral movement. The WIS can also sum up the intensity over each light projection to determine the amplitude or total intensity at each aperture. The WIS can generate one or more images of the object based on the measured amplitude and/or phase gradient information. Some embodiments include a WIS that can be used in applications such as microscopy, photography, or other imaging devices. For example, an embodiment of a WIS can be used in place of a conventional camera in a standard bright-field microscope. The WIS can transform the bright-field microscope into a wavefront microscope that can provide both bright-field (transmitted light intensity) and phase gradient images. Since the WIS of some embodiments can detect light intensity/amplitude variations in addition to the phase variations, the WIS of these embodiments can replace sensors in digital cameras. Some other examples of applications that may benefit from the use the phase gradient measuring capability of the WIS include machine recognition, object ranging, and texture assessment. In addition, fields such as LASIK surgery and high-resolution retinal imaging can also benefit from the phase gradient measuring capability of the WIS. The WIS of many embodiments provides advantages because the WIS can self focus the light in the high Fresnel number regime which narrows the light projections received by the light detector without the need of lenses. First, this self-focusing scheme is advantageous over conventional wavefront sensors such as Shack-Hartmann sensors which use microlenses to narrow light projections. By avoiding the need for lenses, the cost for WIS devices can be reduced. Also, since the light projections through the apertures are narrowed, the apertures can be arranged in a more dense fashion, which can provide more highly populated light data and improved sensor sensitivity. Further, the narrowing of light projections avoids crosstalk or interference between neighboring projections, which can also improve image quality. Another advantage of the WIS of some embodiments is that it can implement phase gradient measuring functionality onto a simple sensor chip such as a CMOS (complementary metal-oxide-semiconductor) chip. In some cases, the different layers of the WIS can be formed as part of the sensor chip fabrication process, which minimizes the cost. This implementation is advantageous over conventional phase sensing devices that use bulky optical elements to provide similar functionality. Since there are no bulky optical elements, the WIS can be more and robust (less optical elements to break), less expensive, and simpler in use and design than conventional phase sensing devices. An imaging device employing a WIS of embodiments of the invention also provides advantages because it will not require polarized light as part of its imaging technique. Since the imaging device will does not depend on the polarization of the light (illumination), the imaging device can use unpolarized light to generate artifact-free phase gradient and intensity images for both birefringent and homogenous objects. Also, an ordinary illumination source can be used such as the illumination source used in a conventional microscope. I. WIS (Wavefront Imaging Sensor) FIG. 2( a ) is schematic drawing of a perspective view of components of a WIS 100 , according to an embodiment of the invention. In the illustrated example, the WIS 100 comprises an aperture layer 110 , a light detector 120 and a transparent layer 130 between the aperture layer 110 and the light detector 120 . The aperture layer 110 has one or more apertures 114 in the form of a two-dimensional array 112 of apertures 114 . In this embodiment, the two-dimensional array 112 has the dimensions of 3×3. Other embodiments can have any suitable dimensions. Although the apertures 112 are shown to be a two-dimensional array in many embodiments, the apertures 112 may be in the form of a one-dimensional array of apertures 114 , a multitude of one-dimensional and/or two-dimensional array of apertures, or other suitable arrangement of apertures in other embodiments. FIG. 2( b ) is schematic drawing of a cross section of the WIS 100 of FIG. 2( a ) through an aperture 114 showing some of the details of the WIS 100 , according to an embodiment of the invention. In FIG. 2( b ), the WIS 100 comprises an aperture layer 110 having an aperture 114 , a light detector 120 and a transparent layer 130 between the aperture layer 110 and the light detector 120 . The aperture layer 110 includes a first surface 116 and a second surface 118 . The light detector 120 (e.g., CMOS, charge-coupled device (CCD), etc.) includes a plurality of light detecting elements 122 , a first surface 124 and a second surface 126 . In FIGS. 2( a ) and 2 ( b ), the plurality of light detecting elements 122 includes a 5×5 grid of light detecting elements 122 corresponding (assigned) to each aperture 114 . The transparent layer 130 has a thickness “H” between the second surface 118 of the aperture layer 110 and the surface 124 of light detector 120 . In FIG. 2( b ), a modulated light wave 140 (e.g. an image wavefront) impinges the aperture layer 110 at an incident angle α. The light transmission through the aperture 114 forms a light projection (not shown) on the light detector 120 . The center of the light projection shifts Δs based on the incident angle α. A WIS 100 of some embodiments can refer to a multi-layer structure. The WIS 100 includes an opaque or semi-opaque aperture layer 110 with one or more apertures 114 in it. The opaque or semi-opaque aperture layer 110 can be a thin metallic layer in some cases. The WIS 100 may optionally include a transparent protective layer (not shown) that covers the opaque or semi-opaque aperture layer 110 to isolate the opaque or semi-opaque aperture layer 110 . The aperture layer 110 can have any suitable thickness. An aperture 114 can refer to a light transmissive region in the aperture layer 110 . In many embodiments, the aperture 114 is a hole, which can be a void or filled with a transparent material. The aperture 114 can have any suitable cross-sectional shape (e.g., a circle, rectangle, triangle, oval, etc.) and any suitable size “d” (e.g., 1 micron, 3 microns, 6 microns, etc.). In one exemplary embodiment, an aperture 114 is a circular hole having a diameter of 6 microns. Many embodiments of the WIS 100 include one or more apertures 114 in the form of a two-dimensional array of apertures 112 . In other embodiments, the apertures 114 can be in other suitable arrangements such as a one-dimensional array, or a multitude of one-dimensional arrays and/or two-dimensional arrays. The array of apertures can have any suitable dimension such as 500×500, 1000×500, 1×1, 10×10, etc. The apertures 114 in an aperture layer 110 can have any suitable spacing between adjacent apertures 114 . In one embodiment, the aperture layer 110 may have closely spaced apertures having any suitable close aperture spacing. Some examples of suitable close aperture spacing include 1 micron, 5 microns, and 10 microns, etc., where the aperture size is 5 microns. In one exemplary embodiment, a close aperture spacing is 11 microns. In some cases, a WIS 100 having an aperture layer 110 with close aperture spacing may collect densely populated light data at the light detector 120 . The transparent layer 130 between the light detector 120 and the aperture layer 110 can include one or more layers of transparent or semi-transparent material such as water or a viscous polymer (e.g., SU-8 resin), or can be a vacuum or gas-filled space. The transparent layer 130 can have any suitable thickness H. In some cases, the transparent layer 130 is sized to have a predetermined thickness H which locates the light detector 120 at a self-focusing plane. A light detector 120 (e.g., photosensor) can refer to any suitable device capable of detecting light and generating signals with data about the amplitude, intensity, and phase gradient of the impinging light in x and y directions, and/or other information about the light being detected. The signals may be in the form of electrical current that results from the photoelectric effect. Some examples of suitable light detectors 120 include a charge coupled device (CCD) or a linear or two-dimensional array of photodiodes (e.g., avalanche photodiodes (APDs)). A light detector 120 could also be a complementary metal-oxide-semiconductor (CMOS) or photomultiplier tubes (PMTs). Other suitable light detectors 120 are commercially available. Some examples of suitable light detectors are described in Section IB. The light detector 120 comprises one or more light detecting elements 122 (e.g., sensor pixels). The light detecting elements 122 can be of any suitable size (e.g., 1-4 microns) and any suitable shape (e.g., circular or square). The light detecting elements 122 can be arranged in any suitable form. Some examples of suitable forms include a one-dimensional array, a two-dimensional array and a multitude of one-dimensional and/or two-dimensional arrays. In some cases, the light detecting elements 232 can be arranged in the similar form to the apertures 112 and map to the apertures 114 . In many embodiments, one or more of the plurality of light detecting elements 122 is assigned (corresponds) to a specific aperture 114 and measures the light projection associated with the specific aperture 114 . Any suitable number of light detecting elements 122 can be used to correspond to a single aperture 114 . In one embodiment, a two-dimensional array of light detecting elements 122 having a dimension of MN×MN corresponds to a two-dimensional array of aperture 114 having a dimension of M×M. In this embodiment, a portion of the MN×MN array consisting of a two-dimensional array of N×N light detecting elements 122 corresponds to each aperture 114 . For example, a two-dimensional 15×15 (N=5, M=3) array of light detecting elements 122 can correspond to a two-dimensional 3×3 (M=3) array of apertures 114 . In this example, a two-dimensional 5×5 (N=5) array of light detecting elements 122 corresponds to each aperture 114 and measures the light projection associated with that aperture 114 . An imaging device employing the WIS 100 of this example can effectively generate a light field image having an M×M pixel image resolution. FIGS. 3( a ) and 3 ( b ) are schematic drawings of a perspective view of components of a WIS 100 , according to embodiments of the invention. In FIGS. 3( a ) and 3 ( b ), the WIS 100 comprises an aperture layer 110 , a light detector 120 and a transparent layer 130 between the light detector 120 and the aperture layer 110 . The aperture layer 110 has a one or more apertures 114 in the form of a 3×3 two-dimensional array of apertures 112 . The apertures 114 are holes having a dimension d and an aperture spacing a. The transparent layer 110 has a thickness H. The light detector 120 comprises a plurality of light detecting elements 122 in the form of a 15×15 two-dimensional array. In FIGS. 3( a ) and 3 ( b ), a 5×5 two-dimensional array of light detecting elements 122 corresponds to each of the apertures 114 . The WIS 100 also comprises an x-axis, y-axis, and a z-axis at the surface 116 of the aperture layer 110 . The WIS 100 also includes an s-axis and a t-axis at the surface 126 of the light detector 120 . In FIG. 3( a ), the WIS 100 also includes an illumination source 150 providing light to the aperture layer 110 . An illumination source 150 can refer to any suitable device or other source of light. The light provided by illumination source 150 can be of any suitable wavelength and intensity. Also, the light can include polarized and/or unpolarized light. In embodiments where unpolarized light is used, the WIS 100 can detect light data that can be used to generate artifact-free images of birefringence specimens. Suitable illumination sources 150 are naturally and commercially available. In some embodiments, the illumination source 150 can be a component of the WIS 100 . In other embodiments, the illumination source 150 can be a separate component from the WIS 100 . In one embodiment, the illumination source 150 is a broadband halogen lamp. An illumination source 150 can be placed in any suitable location and positioned in any suitable incident angle α to provide appropriate light to the WIS 100 . In some embodiments, multiple illumination sources 150 may provide light in one or more directions. For example, a camera system employing a WIS 100 of an embodiment can have a first illumination source 150 that provides light in a first direction such as from a flash and a second illumination source 150 that provides light in a second direction. The first direction can be different from second direction, similar to the second direction, or the same as the second direction. In other embodiments, a single illumination source 150 provides light in a single direction. For example, a microscope system comprising a WIS 100 may have a single illumination source 150 positioned to provide light in the negative z-direction. FIGS. 3( a ) and 3 ( b ) also demonstrate the operating principle of the WIS 100 . As shown in FIG. 3( a ), when a light wave 140 is incident upon the aperture layer 110 , the transmission through the aperture 114 forms a light projection 128 on the light detecting elements 122 (e.g., sensor pixels) of the light detector 120 . A light projection 128 can refer to the light data received from light passing through a particular aperture at a specific plane parallel to the surface 118 of the aperture layer 110 . In many cases, the light projection is received at the surface 124 of the light detector 120 , which may or may not be coincident to a self-focusing plane (not shown). The light projection 128 in some illustrated embodiments is shown as a spot on the light detector 120 . As shown in FIGS. 3( a ) and 3 ( b ), when a light wave 140 is incident upon the aperture layer 110 , light passing through a particular aperture 114 generates a spot (light projection) 128 on the light detecting elements 122 (e.g., sensor pixels) associated with that aperture 114 . Lines have been drawn to show approximate locations of the light projections 128 on the associated light detecting elements 122 . If a light wave 140 impinging an aperture layer 110 at aperture 114 has little to no phase gradient, the light projection 128 is approximately centered about a centerline of the aperture 114 . In some cases, a plane light wave 140 can be based on a uniform light field from an illumination source 150 . If the light wave 140 impinging the aperture layer 110 at an aperture 114 has a non-zero phase gradient at an aperture 114 , the light projection 128 laterally shifts according to the normalized phase gradient of the modulated light wave 140 at that aperture 114 . Due to the non-zero phase gradient, the light projection 128 laterally shifts in the s and/or t directions. In some cases, the modulated light wave 140 may be due to, for example, the introduction of an object into a uniform light field provided by an illumination source 150 . In FIG. 3( a ), the light wave 140 impinging the aperture layer 110 at aperture 114 has a zero phase gradient. In this illustrated example, the light projections 128 received at the light detector 120 are approximately centered about a centerline of the apertures 114 . In FIG. 3( b ), a modulated light wave 140 (e.g., an image wavefront) having a non-zero phase gradient at aperture 114 ( a ) impinges upon the aperture layer 110 . In response, the light projection 128 ( a ) has laterally shifted by Δs in the s direction according to the normalized phase gradient of the modulated light wave 140 at that aperture 114 ( a ). Mathematically, the lateral shifts (Δs and Δt) of each light projection 128 on the light detector 120 are related to the wavelength-normalized phase gradients (θ x and θ y ) of the light wave 140 at the corresponding aperture 114 at (x, y), to the thickness H of the transparent layer 130 , and to the refractive index n of the transparent layer 130 , as: when Δs(x, y)<a light detector having a surface, the light detector configured to receive a light projection at the surface from light passing through the aperture, the light detector further configured to separately measure amplitude and phase information of a wavefront based on the received light projection; and\n
a transparent layer between the aperture layer and the light detector, the transparent layer having a thickness locating the surface of the light detector approximately at a self-focusing plane in a high Fresnel number regime to narrow the light projection."],"number":1,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 1, wherein the light detector measures the phase information of the wavefront at the aperture by estimating a lateral shift of the light projection and determining the phase information based on the estimated lateral shift."],"number":2,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 2,\n
wherein the light detector comprises a plurality of light detecting elements, each light detecting element receiving a signal, and\n
wherein the light detector estimates a lateral shift of the light projection by estimating a center of the projection on the surface of the light detector."],"number":3,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 2, wherein the light detector is configured to measure the phase information of the wavefront at one of the apertures by estimating a lateral shift of the light projection corresponding to the one of the apertures."],"number":4,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 1, wherein the light detector measures the amplitude information of the wavefront at the aperture by summing up the intensity signals over the light projection."],"number":5,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 1,\n
wherein the light detector comprises a plurality of light detecting elements, each light detecting element receiving a signal, and\n
wherein the light detector measures the amplitude information of the wavefront at the aperture by summing up the signals received by the light detecting elements."],"number":6,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 1, further comprising a processor communicatively coupled to the light detector, the processor configured to generate a phase image based on the measured phase information of the wavefront along a user defined direction."],"number":7,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 1, further comprising a processor communicatively coupled to the light detector, the processor configured to generate a phase image based on the measured phase information of the wavefront along an axis of the aperture layer."],"number":8,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 1, further comprising a processor communicatively coupled to the light detector, the processor configured to generate a phase image based on a magnitude of the phase gradient vector of the wavefront determined from the measured phase information of the wavefront."],"number":9,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 1, further comprising a lens at the aperture."],"number":10,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 1, wherein the light projection is a minimum light projection associated with the self-focusing plane."],"number":11,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 1, wherein the transparent layer extends from the aperture layer to the surface of the light detector."],"number":12,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 1, wherein the wavefront imaging sensor is in the form of a wavefront imaging sensor chip."],"number":13,"annotation":false,"claim":true,"title":false},{"lines":["A wavefront imaging sensor comprising,\n
an aperture layer having an array of apertures of set dimensions;\n
a light detector having a surface, the light detector configured to receive one or more light projections at the surface from light passing through the array of apertures, the light detector further configured to separately measure amplitude and phase information of a wavefront based on the received one or more light projections; and\n
a transparent layer between the aperture layer and the light detector, the transparent layer having a thickness locating the surface of the light detector approximately at a self-focusing plane in a high Fresnel number regime to narrow the one or more light projections."],"number":14,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 14, wherein the apertures in the array of apertures are closely spaced."],"number":15,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 14, wherein the light detector includes a plurality of arrays of light detecting elements, wherein each array of light detecting elements is assigned to an aperture."],"number":16,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 14, wherein the light detector measures the amplitude information of the wavefront at one of the apertures by summing up the intensity signals received by the array of light detecting elements assigned to the one of the apertures."],"number":17,"annotation":false,"claim":true,"title":false},{"lines":["The wavefront imaging sensor of claim 14, wherein the transparent layer extends from the aperture layer to the surface of the light detector."],"number":18,"annotation":false,"claim":true,"title":false},{"lines":["A method for separately measuring the amplitude and phase gradient of a wavefront using a wavefront imaging sensor having an aperture layer, a light detector and a transparent layer between the aperture layer and the light detector, the method comprising:\n
receiving a light projection at a surface of the light detector, the light projection from light passing through an aperture of the aperture layer, wherein the aperture has set dimensions, and wherein the surface is located approximately at a self-focusing plane in a high Fresnel number regime to narrow the light projection;\n
estimating a lateral shift of the light projection by estimating a center of the light projection on the surface;\n
measuring the phase gradient of the wavefront at the aperture using the estimated lateral shift of the light projection; and\n
measuring the amplitude of the wavefront at the aperture by summing up intensity signals received by the light detecting elements assigned to the aperture."],"number":19,"annotation":false,"claim":true,"title":false},{"lines":["The method of claim 19, wherein the transparent layer extends from the aperture layer to the surface of the light detector."],"number":20,"annotation":false,"claim":true,"title":false}]}},"filters":{"npl":[],"notNpl":[],"applicant":[],"notApplicant":[],"inventor":[],"notInventor":[],"owner":[],"notOwner":[],"tags":[],"dates":[],"types":[],"notTypes":[],"j":[],"notJ":[],"fj":[],"notFj":[],"classIpcr":[],"notClassIpcr":[],"classNat":[],"notClassNat":[],"classCpc":[],"notClassCpc":[],"so":[],"notSo":[],"sat":[]},"sequenceFilters":{"s":"SEQIDNO","d":"ASCENDING","p":0,"n":10,"sp":[],"si":[],"len":[],"t":[],"loc":[]}}